Display apparatus comprising a bridge portion formed of a same material as a second color filter and connecting adjacent second color filters of adjacent pixel areas

ABSTRACT

A display apparatus includes pixel areas and a light blocking area between the pixel areas. The display apparatus includes a first base substrate, a thin film transistor, and first, second, and third color filters. The first color filter has a first color, the second color filter has a second color different from the first color, and the third color filter has a third color different from the first and second colors. In the light blocking area, the thin film transistor, the first color filter, and the third color filter at least partially overlap each other. The second color filter in at least one pixel area is connected to an adjacent second color filter disposed in an adjacent pixel area by a bridge portion, and the bridge portion is formed of the same material as the second color filter and is disposed in the light blocking area.

The present application claims priority to and the benefit of KoreanPatent Application No. 10-2017-0035570, filed on Mar. 21, 2017, thedisclosure of which is incorporated by reference herein in its entirety.

BACKGROUND 1. Field

Example embodiments of the inventive concept relate to a displayapparatus and a method of manufacturing the display apparatus. Moreparticularly, example embodiments of the inventive concept relate to adisplay apparatus including a lower substrate including a color filterand a method of manufacturing the display apparatus.

2. Description of the Related Art

Recently, a display apparatus having light weight and small size hasbeen manufactured. A cathode ray tube (CRT) display apparatus has beenused due to a performance and a competitive price. However the CRTdisplay apparatus has a weakness with a size or portability. Therefore adisplay apparatus such as a plasma display apparatus, a liquid crystaldisplay apparatus and an organic light emitting display apparatus hasbeen highly regarded due to small size, light weight andlow-power-consumption.

The liquid crystal display apparatus applies a voltage to specificmolecular arrangement configured to change the molecular arrangement.The liquid crystal display apparatus displays an image using changes ofoptical property (for example, birefringence, rotatory polarization,dichroism and light scattering) of a liquid crystal cell according tothe changes of the molecular arrangement.

The display apparatus includes a color filter disposed in a pixel areain which an image is displayed, a black matrix disposed in a lightblocking area where no image is displayed, and a column spacer formaintaining cell gap between a lower substrate and an upper substrate.However, in order to form the black matrix, an additional mask isrequired, there are problems that the structure of the display apparatusis complicated and the manufacturing cost is increased. In addition, thecolumn spacer may include a main column spacer which is always incontact with the upper substrate and a sub-column spacer formed at alower height than the main column spacer. Since the sub-column spacer isformed using a halftone mask or the like, it has been difficult to formthe sub-column spacer at a proper position at a uniform height.Accordingly, it is difficult to maintain the cell gap of the displayapparatus.

SUMMARY

One or more example embodiment of the inventive concept provides adisplay apparatus having a simple structure, capable of implement alight blocking area without an additional light blocking member such asa black matrix, and capable of maintaining a cell-gap which is a gapbetween a lower substrate and an upper substrate.

One or more example embodiments of the inventive concept also provide amethod of manufacturing the display apparatus.

According to an example embodiment of the inventive concept, a displayapparatus includes a plurality of pixel areas and a light blocking areabetween the pixel areas. The display apparatus includes a first basesubstrate, a thin film transistor disposed on the first base substratecorresponding to each of the pixel areas, a first color filter having afirst color and disposed on the first base substrate, a second colorfilter having a second color different from the first color, anddisposed on the first base substrate, and a third color filter having athird color different from the first and second colors, and disposed onthe first base substrate. In the light blocking area, the thin filmtransistor, the first color filter, and the third color filter at leastpartially overlap each other. The second color filter in at least onepixel area is connected to an adjacent second color filter disposed isan adjacent pixel area by a bridge portion, and the bridge portion isformed of the same material as the second color filter and is disposedin the light blocking area.

In an example embodiment, the first color may be red, the second colormay be green, and the third color may be blue.

In an example embodiment, the first color filter may extend in a firstdirection across a plurality of pixel areas. The second color filter mayextend in the first direction across a plurality of pixel areas. Thethird color filter may extend in the first direction across a pluralityof pixel areas, so that each of the first, second, and third colorfilters may be arranged in a strip shape.

In an example embodiment, the bridge portion may not overlap with thethin film transistor.

In an example embodiment, the display apparatus may further include afourth color filter disposed on the first base substrate, the fourthcolor filter may be transparent. The first, second, and third colorfilters may overlap with the fourth color filter.

In an example embodiment, the display apparatus may further include anorganic insulation layer disposed on the first, second, and third colorfilters, and including an organic insulation material.

In an example embodiment, the display apparatus may further include ashielding electrode disposed on the organic insulation layer in thelight blocking area.

In an example embodiment, the display apparatus may further include apixel electrode electrically connected to the thin film transistor andformed from a same layer as the shielding electrode. The pixel electrodemay be electrically connected through a contact hole extending throughthe first color filter, the third color filter, and the organicinsulation layer.

In an example embodiment, the display apparatus may further include afloating electrode disposed on the first base substrate. The pixelelectrode may include a stem extending in a first direction or a thirddirection. A plurality of slits may extend from the stem to an edge ofthe pixel electrode.

In an example embodiment, the display apparatus may further include asecond base substrate facing the first base substrate, a liquid crystallayer between the first base substrate and the second base substrate,and a main column spacer overlapping the first, second, and third colorfilters. The main column spacer may be for maintaining a cell gap of theliquid crystal layer.

In an example embodiment, the bridge portion of the second color filtermay overlap the first color filter, the third color filter, or the firstand third color filters. A second sub-column spacer which may be smallerthan the main column spacer is formed by the bridge portion formaintaining a pressing gap of the liquid crystal layer.

In an example embodiment, the display apparatus may further include afirst sub-column spacer which is smaller than the main column spacer formaintaining the pressing gap.

In an example embodiment, the display apparatus may further include ashielding electrode disposed in the light blocking area and including atransparent conductive material. The shielding electrode may be a meshstructure along the light blocking area. The second color filter may becut off at a portion where the bridge portion is disposed, so that thebridge portion may not overlap with the shielding electrode.

In an example embodiment, the first color may be red, and the firstcolor filter may be cut off at a portion where the bridge portion isdisposed. The bridge portion may entirely overlap with the third colorfilter in the light blocking area, and the bridge portion may notentirely overlap with the first color filter.

In an example embodiment, the third color may be blue. The third colorfilter may be cut off at a portion where the bridge portion may bedisposed. The bridge portion may entirely overlap with the first colorfilter in the light blocking area, and the bridge portion may notentirely overlap with the third color filter.

According to an example embodiment of the inventive concept, a displayapparatus includes first, second, third, fourth, fifth, and sixth pixelareas which are arranged in a 3*2 matrix form in a second direction andin a first direction, and a light blocking area between the first,second, third, fourth, fifth, and sixth pixel areas. The displayapparatus includes a first color filter disposed in the first pixelarea, and the second pixel area which is adjacent to the first pixelarea in the first direction, a second color filter disposed in the thirdpixel area adjacent to the first pixel area in the second direction, andthe fourth pixel area adjacent to the third pixel area in the firstdirection, and a third color filter disposed in the fifth pixel areaadjacent to the third pixel area in the second direction, and the sixthpixel area adjacent to the fifth pixel area in the first direction. Thethird color filter overlaps with the first color filter in the lightblocking area. The second color filter includes a bridge portion in thelight blocking area between the third pixel area and the forth pixelarea.

In an example embodiment, the first color filter may be a red colorfilter, the second color filter may be a green color filter, and thethird color filter may be a blue color filter.

In an example embodiment, the display apparatus may further include afourth color filter disposed in a seventh pixel area and an eighth pixelarea adjacent to the seventh pixel area in the first direction. Thefourth color filter may be a transparent color filter, and be disposedin the entirety of the first, second, third, fourth, fifth, sixth,seventh, and eighth pixel areas.

In an example embodiment, the display apparatus may further include aliquid crystal layer dispose in the first, second, third, fourth, fifth,and sixth pixel area, and a main column spacer for maintaining a cellgap of the liquid crystal layer. The bridge portion of the second colorfilter may overlap the first color filter, the third color filter, orthe first and third color filters. A second sub-column spacer which issmaller than the main column spacer may be formed by the bridge portionfor maintaining a pressing gap of the liquid crystal layer.

In an example embodiment, the display apparatus may further include ashielding electrode disposed in the light blocking area and including atransparent conductive material.

According to an example embodiment of the inventive concept, a displayapparatus includes a plurality of pixel areas and a light blocking areabetween the pixel areas. The display apparatus further includes a firstbase substrate, a thin film transistor disposed on the first basesubstrate corresponding to each of the pixel area, a first color filterhaving a first color and disposed on the first base substrate, a secondcolor filter having a second color different from the first color, anddisposed on the first base substrate, and a third color filter having athird color different from the first and second color, and disposed onthe first base substrate. In the light blocking area, the thin filmtransistor, the first color filter, and the third color filter at leastpartially overlap each other. The second color filter may be connectedto an adjacent second color filter by a bridge portion, and the bridgeportion and the second color filter include the same material.

According to the present example embodiment, the light blocking functioncan be improved by overlapping of the first and third color filters, afirst floating electrode, a gate pattern, a data pattern and a shieldingelectrode in the light blocking area of the display apparatus. Further,the shielding function can be improved by a gate line and the shieldingelectrode of the light blocking area. Accordingly, the display apparatuscan implement the light blocking area without an additional black matrixstructure.

In addition, since a second sub-column spacer is formed by the bridgeportion of the display apparatus, the pressing gap of the displayapparatus can be effectively maintained.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the inventive concept asclaimed

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features of the inventive concept will become moreapparent by describing in detail example embodiments thereof withreference to the accompanying drawings, in which:

FIG. 1 is a block diagram illustrating a display apparatus according toan example embodiment of the inventive concept;

FIG. 2 is a plan view illustrating first to sixth pixel areas of thedisplay apparatus of FIG. 1 in detail;

FIGS. 3A, 3B and 3C are plan views illustrating a first color filter, asecond color filter, and a third color filter of the display apparatusof FIG. 2, respectively;

FIG. 4A is a plan view illustrating a shielding electrode and a pixelelectrode of the display apparatus of FIG. 2;

FIG. 4B is an enlarged plan view of a vicinity of a first thin filmtransistor of the display apparatus of FIG. 2.

FIGS. 5A, 5B and 5C are cross-sectional views taken along line I-I′,II-II′ and III-III′ of the display apparatus of FIG. 2, respectively;

FIG. 6 is a plan view illustrating first to sixth pixel areas of adisplay apparatus according to an example embodiment of the inventiveconcept;

FIG. 7 is a plan view illustrating a second color filter of the displayapparatus of FIG. 6;

FIGS. 8A, 8B and 8C are cross-sectional views taken along line I-I′,II-II′ and III-III′ of the display apparatus of FIG. 6, respectively;

FIG. 9 is a plan view illustrating first to eighth pixel areas of adisplay apparatus according to an example embodiment of the inventiveconcept;

FIGS. 10A, 10B, 10C and 10D are plan views illustrating a first colorfilter, a second color filter, a third color filter and a fourth colorfilter of the display apparatus of FIG. 9, respectively;

FIGS. 11A, 11B, 11C and 11D are cross-sectional views taken along lineI-I′, II-II′, III-III′, and IV-IV′ of the display apparatus of FIG. 9,respectively;

FIG. 12 is a plan view briefly illustrating pixel areas of a displayapparatus according to an example embodiment of the inventive concept;

FIGS. 13A, and 13B are cross-sectional views taken along line I-I′ andII-II′ of the display apparatus of FIG. 12, respectively;

FIG. 14 is a plan view illustrating first to sixth pixel areas of adisplay apparatus according to an example embodiment of the inventiveconcept;

FIGS. 15A, 15B and 15C are plan views illustrating a first color filter,a second color filter, and a third color filter of the display apparatusof FIG. 14, respectively;

FIGS. 16A, 16B and 16C are cross-sectional views taken along line I-I′,II-II′ and III-III′ of the display apparatus of FIG. 14, respectively;

FIG. 17 is a plan view illustrating first to sixth pixel areas of adisplay apparatus according to an example embodiment of the inventiveconcept;

FIGS. 18A, 18B and 18C are plan views illustrating a first color filter,a second color filter, and a third color filter of the display apparatusof FIG. 17, respectively;

FIGS. 19A, 19B and 19C are cross-sectional views taken along line I-I′,II-II′ and III-III′ of the display apparatus of FIG. 17, respectively;and

FIGS. 20A, 20B, 20C, 20D, 20E, 20F, 20G and 20H are a method ofmanufacturing the display apparatus of FIG. 2.

DETAILED DESCRIPTION

Hereinafter, the inventive concept will be explained in detail withreference to the accompanying drawings.

FIG. 1 is a block diagram illustrating a display apparatus according toan example embodiment of the inventive concept.

Referring to FIG. 1, the display apparatus may include a display panel10 and a display panel driver. The display panel driver may include atiming controller 20, a gate driver 30, a gamma reference voltagegenerator 40 and a data driver 50.

The display panel 10 may include a plurality of gate lines GL, aplurality of data lines DL and a plurality of pixels electricallyconnected to the gate lines GL and the data lines DL. The gate lines GLmay extend in a first direction D1 and the data lines DL may extend in asecond direction D2 crossing the first direction D1.

Each pixel may include a switching element, a liquid crystal capacitorand a storage capacitor. The liquid crystal capacitor and the storagecapacitor are electrically connected to the switching element. Thepixels may be disposed in a matrix form.

The display panel 10 may include a first substrate, a second substratefacing the first substrate and a liquid crystal layer disposed betweenthe first substrate and the second substrate. The gate lines, the datalines, pixel electrodes of the pixels and the switching elements may beformed on the first substrate. A common electrode may be formed on thesecond substrate.

The structure of the display panel 10 may be explained referring toFIGS. 2, 3A, 3B, 3C, 4A, 4B, 5A, 5B and 5C in detail.

The timing controller 20 may receive input image data IMG and an inputcontrol signal CONT from an external apparatus (not shown). The inputimage data IMG may include red image data, green image data and blueimage data. The input control signal CONT may include a master clocksignal and a data enable signal. The input control signal CONT mayfurther include a vertical synchronizing signal and a horizontalsynchronizing signal.

The timing controller 20 may generate a first control signal CONT1, asecond control signal CONT2, a third control signal CONT3 and a datasignal DATA based on the input image data IMG and the input controlsignal CONT.

The timing controller 20 may generate the first control signal CONT1 forcontrolling an operation of the gate driver 30 based on the inputcontrol signal CONT, and outputs the first control signal CONT1 to thegate driver 30. The first control signal CONT1 may further include avertical start signal and a gate clock signal.

The timing controller 20 may generate the second control signal CONT2for controlling an operation of the data driver 50 based on the inputcontrol signal CONT, and outputs the second control signal CONT2 to thedata driver 50. The second control signal CONT2 may include a horizontalstart signal and a load signal.

The timing controller 20 may generate the data signal DATA based on theinput image data IMG. The timing controller 20 may output the datasignal DATA to the data driver 50.

The timing controller 20 may generate the third control signal CONT3 forcontrolling an operation of the gamma reference voltage generator 40based on the input control signal CONT, and output the third controlsignal CONT3 to the gamma reference voltage generator 40.

The gate driver 30 may generate gate signals driving the gate lines GLin response to the first control signal CONT1 received from the timingcontroller 20. The gate driver 30 may sequentially output the gatesignals to the gate lines GL.

The gamma reference voltage generator 40 may generate a gamma referencevoltage VGREF in response to the third control signal CONT3 receivedfrom the timing controller 20.

The gamma reference voltage generator 40 may provide the gamma referencevoltage VGREF to the data driver 50. The gamma reference voltage VGREFmay have a value corresponding to a level of the data signal DATA.

In an exemplary embodiment, the gamma reference voltage generator 40 maybe disposed in the timing controller 20, or in the data driver 50.

The data driver 50 may receive the second control signal CONT2 and thedata signal DATA from the timing controller 20, and receive the gammareference voltages VGREF from the gamma reference voltage generator 40.The data driver 50 may convert the data signal DATA into data voltageshaving an analog type using the gamma reference voltages VGREF. The datadriver 50 may output the data voltages to the data lines DL.Accordingly, the display apparatus may display an image by emittinglight from a plurality of pixel areas (PX1 to PX6) which arecorresponding to the pixels mentioned above, respectively.

FIG. 2 is a plan view illustrating first to sixth pixel areas PX1 to PX6of the display apparatus of FIG. 1 in detail. FIGS. 3A, 3B and 3C areplan views illustrating a first color filter R, a second color filter G,and a third color filter B of the display apparatus of FIG. 2,respectively. FIG. 4A is a plan view illustrating a shielding electrodeSCOM and a pixel electrode PE of the display apparatus of FIG. 2. FIG.4B is an enlarged plan view of a vicinity of a first thin filmtransistor TFT1 of the display apparatus of FIG. 2. FIGS. 5A, 5B and 5Care cross-sectional views taken along line I-I′, II-II′ and III-III′ ofthe display apparatus of FIG. 2, respectively.

Referring to FIGS. 2, 3A, 3B, 3C, 4A, 4B, 5A, 5B and 5C, the displayapparatus may include a first pixel area PX1, a second pixel area PX2, athird pixel area PX3, a fourth pixel area PX4, a fifth pixel area PX5, asixth pixel area PX6, sometimes collectively referred to as the first tosixth pixel areas PX1 to PX6, and a light blocking area BM between thefirst to sixth pixel areas PX1 to PX6. The first to sixth pixel areasPX1 to PX6 may be arranged in a 3*2 matrix form in the second directionD2 and the first direction D1. The second direction D2 may besubstantially perpendicular to the first direction D1. The first tosixth pixel areas PX1 through PX6 are regions in which light is emittedfor the display apparatus to display an image, and the light blockingarea BM are regions in which no light is emitted.

Although only a pixel structure of six pixel areas is shown in thedrawing, the display apparatus may have a structure in which the pixelstructure is repeatedly formed.

The display apparatus may include a lower substrate, an upper substrateopposite to the lower substrate, and a liquid crystal layer LC betweenthe lower substrate and the upper substrate.

The lower substrate may include a first polarizer POL1, a first basesubstrate 100, a buffer layer 110, a gate pattern, an active patternACT, a data pattern, a first insulation layer 120, the first colorfilter R, the third color filter B, an organic insulation layer 130, atransparent electrode pattern, a main column spacer MCS, a firstsub-column spacer SCS1, and a first alignment layer AL1.

The first polarizer POL1 may be attached on the first base substrate100. The first polarizer POL1 may be disposed between a backlight unit(not shown) for providing light to the liquid crystal layer LC and thefirst base substrate 100. The first polarizer POL1 may polarizetransmitted light, and a commonly used polyvinyl alcohol (PVA) polarizercan be used for the first polarizer POL1. Although not shown in figures,in some example embodiment, the first polarizer POL1 may be a wire gridpolarizer formed on the first base substrate 100.

The first base substrate 100 may include a transparent insulationsubstrate. For example, the first base substrate 100 may include a glasssubstrate, a quartz substrate, a transparent resin substrate, etc.Examples of the transparent resin substrate for the first base substrate100 may include polyimide-based resin, acryl-based resin,polyacrylate-based resin, polycarbonate-based resin, polyether-basedresin, sulfonic acid containing resin, polyethyleneterephthalate-basedresin, etc.

The buffer layer 110 may be disposed on the first base substrate 100. Ifa top surface of the first base substrate 100 is not planar, the bufferlayer 110 may be planarized. The buffer layer 110 may be formed using aninorganic insulation material, or an organic insulation material.

The gate pattern may be disposed on the buffer layer 110. The gatepattern may include a first gate line GL1, a second gate line GL2, athird gate line GL3, a first floating electrode FE1, a second floatingelectrode FE2 and a third floating electrode FE3. The gate pattern mayinclude a metal such as aluminum (Al), copper (Cu), titanium (Ti), etc.

Each of the first gate line GL1, the second gate line GL2 and the thirdgate line GL3 may extend in the first direction D1 and be spaced apartfrom each other in the second direction D2. The first gate line GL1 maybe electrically connected to a gate electrode GE of the first thin filmtransistor TFT1 and a gate electrode of a second thin film transistorTFT2. The second gate line GL2 may be electrically connected to a gateelectrode of a third thin film transistor TFT3 and a gate electrode of afourth thin film transistor TFT4. The third gate line GL3 may beelectrically connected to a gate electrode of a fifth thin filmtransistor TFT5 and a gate electrode of a sixth thin film transistorTFT6.

The first floating electrode FE1 may be disposed at boundaries of thefirst to sixth pixel areas PX1 to PX6 and the light blocking areas BM,so that the first floating electrode FE1 may block light where lightleakage occurs due to difficulty in liquid crystal control. The secondfloating electrode FE2 may be formed to be overlapped with a stem of thepixel electrode PE where a slit is not formed, so that the secondfloating electrode FE2 may block light where light leakage occurs due todifficulty in liquid crystal control. The third floating electrode FE3may be formed to be overlapped with edges of the pixel electrode PE, sothat the third floating electrode FE3 may block light where lightleakage occurs due to difficulty in liquid crystal control. As shown inthe figure, the first, second, and third floating electrodes FE1, FE2,and FE3 may be formed corresponding to respective pixel areas.

The first insulation layer 120 may be disposed on the buffer layer 110on which the gate pattern is formed. The first insulation layer 120 mayinclude a silicon compound, metal oxide, etc. For example, the firstinsulation layer 120 may be formed using silicon oxide (SiOx), siliconnitride (SiNx), silicon oxynitride (SiOxNy), aluminum oxide (AlOx),tantalum oxide (TaOx), hafnium oxide (HfOx), zirconium oxide (ZrOx),titanium oxide (TiOx), etc. These may be used alone or in a combinationthereof. The first insulation layer 120 may be uniformly formed on thefirst base substrate 100 along a profile of the gate pattern. Here, thefirst insulation layer 120 may have a substantially small thickness,such that a stepped portion may be formed at a portion of the gatepattern. In some example embodiments, the first insulation layer 120 mayhave a relatively large thickness for sufficiently covering the gatepattern

The active pattern ACT and a data pattern on the active pattern ACT maybe disposed on the first insulation layer 120. The active pattern ACTand the data pattern may be simultaneously formed using an etch-backprocess or the like.

The active pattern ACT may include a source area which overlaps a sourceelectrode SE, a drain area which overlaps a drain electrode DE and achannel area between the source area and the drain area. The activepattern ACT may include a semiconductor layer consisting of amorphoussilicon (a-Si:H) and an ohmic contact layer consisting of n+ amorphoussilicon (n+ a-Si:H) which makes contact with the source electrode SE orthe drain electrode DE. In addition, the active pattern ACT may includean oxide semiconductor. The oxide semiconductor may include an amorphousoxide including at least one selected from the group consisting ofindium (In), zinc (Zn), gallium (Ga), tin (Sn) and hafnium (Hf).

The data pattern may include a first data line DL1, a second data lineDL2, the source electrode SE, and the drain electrode DE. The datapattern may include a metal such as aluminum (Al), copper (Cu), titanium(Ti), etc.

Each of the first data line DL1 and the second data line DL2 may extendin the second direction D2 and be spaced apart from each other in thefirst direction D1. The first data line DL1 may be electricallyconnected to the source electrode SE of the first thin film transistorTFT1, a source electrode of the third thin film transistor TFT3, and asource electrode of the fifth thin film transistor TFT5. The second dataline DL2 may be electrically connected to a source electrode of thesecond thin film transistor TFT2, a source electrode of the fourth thinfilm transistor TFT4, and a source electrode of the sixth thin filmtransistor TFT6.

The first color filter R may be disposed on the first insulation layer120 on which the data pattern is disposed. The first color filter R mayprovide color to light transmitted through the liquid crystal layer LC.The first color filter R may be a red color filter

The first color filter R may be disposed in the first pixel area PX1,the second pixel area PX2, and the light blocking area BM. Morespecifically, referring again to FIG. 3A, the first color filter R maybe formed in a portion of the light blocking area BM adjacent to thefirst pixel area PX1 where the first thin film transistor TFT1 isdisposed, the first pixel area PX1, a portion of the light blocking areaBM between the first pixel area PX1 and the second pixel area PX2, andthe second pixel area PX2 along the first direction D1. In addition, thefirst color filter R may be formed in the portion of the light blockingarea BM where the first thin film transistor TFT1 is disposed, a portionof the light blocking area BM where the third thin film transistor TFT3is disposed, and a portion of the light blocking area BM where the fifththin film transistor TFT5 is disposed along the second direction D2. Inaddition, the first color filter R may be formed in a portion of thelight blocking area BM where the second thin film transistor TFT2 isdisposed, a portion of the light blocking area BM where the fourth thinfilm transistor TFT4 is disposed, and a portion of the light blockingarea BM where the sixth thin film transistor TFT6 is disposed along thesecond direction D2.

Thus, the first color filter R may be formed in a strip shape along aplurality of pixel areas in the first direction D1 and may be formed inthe light blocking area BM corresponding to a plurality of pixel areasin the second direction D2

In addition, an opening ROP where the first color filter R is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

The second color filter G may be formed on the first insulation layer120 on which the first color filter R is formed. The second color filterG may provide color to light transmitted through the liquid crystallayer LC. The second color filter G may be a green color filter.

The second color filter G may be disposed in the third pixel area PX3and the fourth pixel area PX4. More specifically, referring again toFIG. 3B, the second color filter G may be formed in the third pixel areaPX3 and the fourth pixel area PX4, along the first direction D1. Abridge portion GBR may be disposed in the light blocking area BM. Thebridge portion GBR may be disposed in a portion of the light blockingarea BM where is between two pixel areas in which the second colorfilter G is disposed, so that the bridge portion GBR may connect thesecond color filter G of the two pixel areas.

The bridge portion GBR may overlap the first color filter R and thethird color filter B. Accordingly, in a portion where the bridge portionGBR is formed, the first color filter R, the second color filter G, andthe third color filter B overlap each other to function as a secondsub-column spacer SCS2 (refers to FIGS. 2 and 5B).

In addition, the bridge portion GBR is formed so as not to overlap witha contact hole CNT (see FIGS. 4A, 4B) for the pixel electrode PE and thethird or fourth thin film transistor TFT3 or TFT4. This is because thecontact hole CNT should be formed through the first to third colorfilters R, G, B, and in a portion where the third or fourth thin filmtransistor TFT3 or TFT4 is formed, a lower film thickness by thestructure of the thin film transistors is high, so that it is not aproper position for the second sub-column spacer SCS2.

The bridge portion GBR may be integrally formed with the second colorfilter G in the pixel areas.

Thus, the second color filter G may be formed in a strip shape along thefirst direction D1 across a plurality of pixel areas. In the lightblocking area BM between two pixels areas in which the second colorfilter G is formed, the bridge portion GBR may be formed to connect thesecond color filter G in the two pixel areas.

The third color filter B may be disposed on the first insulation layer120 on which the first and second color filters R and G are disposed.The third color filter B may provide color to light transmitted throughthe liquid crystal layer LC. The third color filter B may be a bluecolor filter.

The third color filter B may be disposed in the fifth pixel area PX5,the sixth pixel area PX6 and the light blocking area BM. Morespecifically, referring again to FIG. 3C, the third color filter B maybe formed in a portion of the light blocking area BM adjacent to thefifth pixel area PX5 where the fifth thin film transistor TFT5 isdisposed, the fifth pixel area PX5, a portion of the light blocking areaBM between the fifth pixel area PX5 and the sixth pixel area PX6, andthe sixth pixel area PX6 along the first direction D1. In addition, thethird color filter B may be formed in the portion of the light blockingarea BM where the first thin film transistor TFT1 is disposed, a portionof the light blocking area BM where the third thin film transistor TFT3is disposed, and a portion of the light blocking area BM where the fifththin film transistor TFT5 is disposed, along the second direction D2. Inaddition, the third color filter B may be formed in a portion of thelight blocking area BM where the second thin film transistor TFT2 isdisposed, a portion of the light blocking area BM where the fourth thinfilm transistor TFT4 is disposed, and a portion of the light blockingarea BM where the sixth thin film transistor TFT6 is disposed, along thesecond direction D2.

Thus, the third color filter B may be formed in a strip shape along aplurality of pixel areas in the first direction D1 and may be formed inthe light blocking area BM corresponding to a plurality of pixel areasin the second direction D2.

In addition, an opening BOP where the third color filter B is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

Accordingly, the first thin film transistor TFT1 including the gateelectrode GE, the active pattern ACT, the source electrode SE and thedrain electrode DE may be formed corresponding to the first pixel areaPX1 in which the first color filter R is disposed. The second thin filmtransistor TFT2 may be formed corresponding to the second pixel PX2 inwhich the first color filter R is disposed. The third thin filmtransistor TFT3 may be formed corresponding to the third pixel area PX3in which the second color filter G is disposed. The fourth thin filmtransistor TFT4 may be formed corresponding to the fourth pixel area PX4in which the second color filter G is disposed. The fifth thin filmtransistor TFT5 may be formed corresponding to the fifth pixel area PX5in which the third color filter B is disposed. The sixth thin filmtransistor TFT6 may be formed corresponding to the sixth pixel area PX6in which the third color filter B is disposed.

The organic insulation layer 130 may be disposed on the first, second,and third color filters R, G and B. The organic insulation layer 130 mayinclude organic insulation material. The organic insulation layer 130may cover the first, second, and third color filters R, G and B, andhave a flat upper surface.

The transparent electrode pattern may be disposed on the organicinsulation layer 130. The transparent electrode pattern may include atransparent conductive material. For example, the transparent electrodepattern may include indium tin oxide (ITO), indium zinc oxide (IZO),etc. The transparent electrode pattern may include the shieldingelectrode SCOM and the pixel electrode PE.

Referring again to FIG. 4, the shielding electrode SCOM may overlap thefirst and second data lines DL1 and DL2, the first, second, and thirdgate lines GL1, GL2 and GL3. Accordingly, the shielding electrode SCOMmay form a mesh structure along the light blocking area BM. A shieldingvoltage may be applied to the shielding electrode SCOM, so that theliquid crystal of the liquid crystal layer LC corresponding to theshielding electrode SCOM may be controlled in a black state.

The pixel electrode PE may be formed to correspond to each of the firstto sixth pixel areas PX1 to PX6. The pixel electrode PE may beelectrically connected to the drain electrode of the thin filmtransistor through a contact hole. The contact hole may be formedthrough the organic insulation layer 130, the first, second, and thirdcolor filters R, G and B, and expose the drain electrode or a contactpad connected to the drain electrode.

The pixel electrode PE may include a stem extending in the firstdirection D1 or the second direction D2. A plurality of slits SLextending from the stem to an edge of the pixel electrode PE may beformed at the pixel electrode PE. The stem of the pixel electrode PE maybe disposed to overlap the first, second or third floating electrodeFE1, FE2 or FE3.

The main column spacer MCS and the first sub-column spacer SCS1 may bedisposed on organic insulation layer 130. The main column spacer MCS maymake contact with the upper substrate to maintain a cell-gap between theupper substrate and the lower substrate. The first alignment layer AL1may be further disposed between the main column spacer MCS and the uppersubstrate. The main column spacer MCS may be disposed to overlap thesixth thin film transistor TFT6. The main column spacer MCS may beformed in the required number in addition to those shown in thedrawings.

The first sub-column spacer SCS1 may be formed lower than the maincolumn spacer MCS. A pressing gap can be maintained by the firstsub-column spacer SCS1 when the liquid crystal display apparatus ispressed by an external force. The first sub-column spacer SCS1 may beoverlapped with the first thin film transistor TFT1 and the second thinfilm transistor TFT2. The first sub-column spacer SCS1 may be formed inthe required number in addition to those shown in the drawings. Thefirst sub-column spacer SCS1 may be formed with the main column spacerMCS using a half-tone mask, or the like.

The first sub-column spacer SCS1 may be formed in a greater number thanthe main column spacer MCS. Thus, for the display apparatus as a whole,a density of the main column spacers MCS may be less than a density ofthe first sub-column spacers SCS1. In addition, the display apparatusmay include the second sub-column spacer SCS2 which will be mentionedlater, and the first sub-column spacer SCS1 can be eliminated.

In addition, referring again to FIG. 5B, an area where the first colorfilter R, the second color filter G and the third color filter B overlapeach other, which is an area where the bridge portion GBR is disposed,is higher than an area where one or two of the color filters is disposedfrom the first base substrate 100, so that the area may form the secondsub-column spacer SCS2. Accordingly, the pressing gap may be effectivelymaintained with the first sub-column spacer SCS1.

Especially, since layers constituting the second sub-column spacer SCS2are formed through a full tone exposure process without using a halftonemask, deviation of the second sub-column spacers SCS2 are very small. Inthe case of the first sub-column spacer SCS1, which is generally formedusing a halftone mask, a height deviation of the first sub-columnspacers SCS1 may occur. In the case of the second sub-column spacer SCS2formed without the halftone mask, deviation of the second sub-columnspacers SCS2 may be very small. Thus, a plurality of the secondsub-column spacers SCS2 having a uniform height can be formed.

In the present embodiment, the main column spacer MCS and the firstsub-column spacer SCS1 are disposed so as not to overlap with theshielding electrode SCOM. However, the main column spacer MCS and thefirst sub-column spacer SCS1 may be overlapped with the shieldingelectrode SCOM as need.

The first alignment layer AL1 may be disposed on the transparentelectrode pattern, the main column spacer MCS, the first sub-columnspacer SCS1 and the organic insulation layer 130. The first alignmentlayer AL1 may include an alignment material capable of aligning theliquid crystal molecules of the liquid crystal layer LC.

The upper substrate may include a second base substrate 200, a commonelectrode CE, a second alignment layer AL2 and a second polarizer POL2.

The second base substrate 200 may include a transparent insulationsubstrate. For example, the second base substrate 200 may include aglass substrate, a quartz substrate, a transparent resin substrate, etc.Examples of the transparent resin substrate for the second basesubstrate 200 may include polyimide-based resin, acryl-based resin,polyacrylate-based resin, polycarbonate-based resin, polyether-basedresin, sulfonic acid containing resin, polyethyleneterephthalate-basedresin, etc.

The common electrode CE may be disposed on the second base substrate200. A common voltage may be applied to the common electrode CE. Thecommon electrode CE may include a transparent conductive material. Forexample, the common electrode CE may include indium tin oxide (ITO),indium zinc oxide (IZO), etc.

The second alignment layer AL2 may be disposed on the common electrodeCE. The second alignment layer AL2 may include an alignment materialcapable of aligning the liquid crystal molecules of the liquid crystallayer LC. Meanwhile, the first and second alignment layers AL1 and AL2may be eliminated according to the constituent material of the liquidcrystal layer LC if necessary. When the display apparatus does notinclude the first and second alignment layers AL1 and AL2, the maincolumn spacer MCS may make contact with the common electrode directly.

The second polarizer POL2 may be attached on a surface of the secondbase substrate 200 opposite to a surface of the second base substrate200 on which the common electrode CE is formed. The second polarizerPOL2 may polarize transmitted light, and a commonly used polyvinylalcohol (PVA) polarizer can be used. A polarizing axis of the secondpolarizer POL2 may be perpendicular to a polarizing axis of the firstpolarizer POL1 Although not shown in the figures, in some exampleembodiment, the second polarizer POL2 may be a wire grid polarizerformed on the second base substrate 200.

The liquid crystal layer LC may be disposed between the first alignmentlayer AL1 and the second alignment layer AL2. The liquid crystal layerLC may include liquid crystal molecules having optical anisotropy. Theliquid crystal molecules are driven by an electric field, so that animage is displayed by passing or blocking light through the liquidcrystal layer LC.

According to the present example embodiment, the light blocking area BMmay further overlap the gate lines, so that the light blocking area BMmay have a mesh structure. In a portion of the light blocking area BMwhere extends in the second direction D2, light blocking function may beimproved by overlapping of the first and third color filters R and B,the first floating electrode FE1, the gate and data pattern, and theshielding electrode SCOM.

In addition, in a portion of the light blocking area BM extending in thefirst direction D1, light blocking function can be improved by the gateline and the shielding electrode SCOM. Accordingly, the displayapparatus may implement a light blocking area without an additionallayer for light blocking.

In addition, since the second sub-column spacer SCS2 is formed by thebridge portion GBR, the pressing gap of the display apparatus can beeffectively maintained.

FIG. 6 is a plan view illustrating first to sixth pixel areas PX1 to PX6of a display apparatus according to an example embodiment of theinventive concept. FIG. 7 is a plan view illustrating a second colorfilter G of the display apparatus of FIG. 6. FIGS. 8A, 8B and 8C arecross-sectional views taken along line I-I′, II-II′ and III-III′ of thedisplay apparatus of FIG. 6, respectively.

Referring to FIGS. 6, 7, 8A and 8B, the display apparatus may besubstantially same as the display apparatus of FIG. 2, except for asecond color filter G. Therefore, repeated description is omitted.

The second color filter G may be disposed in a third pixel area PX3 anda fourth pixel area PX4. More specifically, referring again to FIG. 7,the second color filter G may be formed in the third pixel area PX3 andthe fourth pixel area PX4 along a first direction D1. A bridge portionGBR may be disposed in the light blocking area BM. The bridge portionGBR may be disposed in a portion of the light blocking area BM betweentwo pixel areas in which the second color filter G is disposed, so thatthe bridge portion GBR may connect the second color filter G of the twopixel areas.

The second color filter G may have a first thickness t1 at the thirdpixel area PX3 and the fourth pixel area PX4. The bridge portion GBR mayhave a second thickness t2 which is smaller than the first thickness t1in the light blocking area BM.

The bridge portion GBR may overlap the first color filter R and thethird color filter B. Accordingly, in a portion where the bridge portionGBR is formed, the first color filter R, the bridge portion GBR and thethird color filter B overlap each other to function as a secondsub-column spacer SCS2. Here, the bridge portion GBR having the secondthickness t2 may be formed using a half-tone mask or the like. Thus, thesecond color filter G having the first thickness t1 may be formed byfull tone exposure, and the bridge portion GBR having the secondthickness t2 may be formed by a half tine exposure.

Accordingly, a height of the second sub-column spacer SCS2 may be lowerthan the second sub-column spacer of the display apparatus of FIG. 2.Thus, it is possible to adjust the height of the second sub-columnspacer SCS2 by adjusting the thickness of the bridge portion GBR.

FIG. 9 is a plan view illustrating first to eighth pixel areas PX1 toPX8 of a display apparatus according to an example embodiment of theinventive concept.

FIGS. 10A, 10B, 10C, and 10D are plan views illustrating a first colorfilter R, a second color filter G, a third color filter B and a fourthcolor filter W of the display apparatus of FIG. 9, respectively. FIGS.11A, 11B, 11C, and 11D are cross-sectional views taken along line I-I′,II-II′, III-III′ and IV-IV′ of the display apparatus of FIG. 9,respectively.

Referring to FIGS. 9, 10A, 10B, 10C, 10D, 11A, 11B, 11C and 11D, thedisplay apparatus may be substantially same as the display apparatus ofFIG. 2, except that the display apparatus further includes a fourthcolor filter W. Therefore, repeated description is omitted.

The display apparatus may include a first pixel area PX1, a second pixelarea PX2, a third pixel area PX3, a fourth pixel area PX4, a fifth pixelarea PX5, a sixth pixel area PX6, a seventh pixel area PX7, a eighthpixel area PX8, sometimes collectively referred to as the first toeighth pixel areas PX1 to PX8, and a light blocking area BM between thefirst to eighth pixel areas PX1 to PX8. The first to eighth pixel areasPX1 to PX8 may be arranged in a 4*2 matrix form in a second direction D2and a first direction D1. A gate pattern may further include a fourthgate line GL4.

The first color filter R may provide color to light transmitted throughthe liquid crystal layer LC. The first color filter R may be a red colorfilter. The first color filter R may be disposed in the first pixel areaPX1, the second pixel area PX2, and the light blocking area BM. Morespecifically, referring again to FIG. 10A, the first color filter R maybe formed in a portion of the light blocking area BM adjacent to thefirst pixel area PX1 where a first thin film transistor TFT1 isdisposed, the first pixel area PX1, a portion of the light blocking areaBM between the first pixel area PX1 and the second pixel area PX2, andthe second pixel area PX2, along the first direction D1. In addition,the first color filter R may be formed in the portion of the lightblocking area BM where the first thin film transistor TFT1 is disposed,a portion of the light blocking area BM where a third thin filmtransistor TFT3 is disposed, a portion of the light blocking area BMwhere a fifth thin film transistor TFT5 is disposed and a portion of thelight blocking area BM where a seventh thin film transistor TFT7 isdisposed, along the second direction D2. In addition, the first colorfilter R may be formed in a portion of the light blocking area BM wherea second thin film transistor TFT2 is disposed, a portion of the lightblocking area BM where a fourth thin film transistor TFT4 is disposed, aportion of the light blocking area BM where a sixth thin film transistorTFT6 is disposed, and a portion of the light blocking area BM where aeighth thin film transistor TFT8 is disposed, along the second directionD2.

Thus, the first color filter R may be formed in a strip shape along aplurality of pixel areas in the first direction D1 and may be formed inthe light blocking area BM corresponding to a plurality of pixel areasin the second direction D2

In addition, an opening ROP where the first color filter R is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

The second color filter G may provide color to light transmitted throughthe liquid crystal layer LC. The second color filter G may be a greencolor filter. The second color filter G may be disposed in the thirdpixel area PX3 and the fourth pixel area PX4. More specifically,referring again to FIG. 10B, the second color filter G may be formed inthe third pixel area PX3 and the fourth pixel area PX4, along the firstdirection D1. A bridge portion GBR may be disposed in the light blockingarea BM. The bridge portion GBR may be disposed in a portion of thelight blocking area BM where is between two pixel areas in which thesecond color filter G is disposed, so that the bridge portion GBR mayconnect the second color filter G of the two pixel areas.

Thus, the second color filter G may be formed in a strip shape along aplurality of pixel areas in the first direction D1. The second colorfilters G in two adjacent pixel areas may be connected with each otherby the bridge portion GBR in the light blocking area BM between the twopixel areas.

The third color filter B may provide color to light transmitted throughthe liquid crystal layer LC. The third color filter B may be a bluecolor filter. The third color filter B may be disposed in the seventhpixel area PX7, the eighth pixel area PX8 and the light blocking areaBM. More specifically, referring again to FIG. 10C, the third colorfilter B may be formed in a portion of the light blocking area BMadjacent to the seventh pixel area PX7 where the seventh thin filmtransistor TFT7 is disposed, the seventh pixel area PX7, a portion ofthe light blocking area BM between the seventh pixel area PX7 and theeighth pixel area PX8, and the eighth pixel area PX8 along the firstdirection D1. In addition, the third color filter B may be formed in theportion of the light blocking area BM where the first thin filmtransistor TFT1 is disposed, a portion of the light blocking area BMwhere the third thin film transistor TFT3 is disposed, a portion of thelight blocking area BM where the fifth thin film transistor TFT5 isdisposed, and a portion of the light blocking area BM where the sevenththin film transistor TFT7 is disposed, along the second direction D2. Inaddition, the third color filter B may be formed in a portion of thelight blocking area BM where the second thin film transistor TFT2 isdisposed, a portion of the light blocking area BM where the fourth thinfilm transistor TFT4 is disposed, a portion of the light blocking areaBM where the sixth thin film transistor TFT6 is disposed, and a portionof the light blocking area BM where the eighth thin film transistor TFT8is disposed along the second direction D2.

Thus, the third color filter B may be formed in a strip shape along aplurality of pixel areas in the first direction D1 and may be formed inthe light blocking area BM corresponding to a plurality of pixel areasin the second direction D2.

In addition, an opening BOP where the third color filter B is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

The fourth color filter W may be a transparent color filter, and may bedisposed in the entirety of the first to eighth pixel areas PX1 to PX8.Accordingly, the fifth pixel area PX5 and the sixth pixel area PX6 mayperform a function as a white pixel. An opening WOP where the fourthcolor filter W is not formed may be formed corresponding to a contacthole for the pixel electrode corresponding to each of the pixel areas.

Since the fourth color filter W is transparent, it may be formed overthe first base substrate 100 as well as the fifth pixel area PX5 and thesixth pixel area PX6. Accordingly, an organic insulation layer 130 (seeFIG. 5A) can be omitted, unlike the display apparatus of FIG. 2.

FIG. 12 is a plan view briefly illustrating pixel areas of a displayapparatus according to an example embodiment of the inventive concept.FIGS. 13A, and 13B are cross-sectional views taken along line I-I′ andII-II′ of the display apparatus of FIG. 12, respectively.

Referring to FIGS. 12, 13A and 13B, the display apparatus may besubstantially same as the display apparatus of FIG. 2, except that abridge portion GBR is omitted in some areas and a shielding electrodeSCOM is broken at the portion where the bridge portion BGR is formed.Therefore, repeated description is omitted.

The display apparatus may include a plurality of pixel areas. Each pixelarea may form a red pixel including a red color filter R, a green pixelincluding a green color filter G, or a blue pixel including a blue colorfilter B. The red pixels, the green pixels, and the blue pixels mayextend in a first direction D1 and may be arranged in a strip shape. Thedisplay apparatus may include a data pattern DP and a gate pattern GP.

There is a portion where the bridge portion GBR is formed and a portionwhere the bridge portion GBR is not formed in the light blocking area BMbetween neighboring green pixels. Accordingly, the green color filter Gmay be connected to each other within several pixel areas. The portionswhere the bridge portion GBR is not formed may be arranged at regularintervals or may be randomly arranged.

The shielding electrode SCOM extending in a second direction D2 may bebroken at a portion where the bridge portion GBR is formed, for examplea portion between a second pixel area PX2 and a third pixel area PX3.Accordingly, the bridge portion GBR may not overlap the shieldingelectrode SCOM.

A portion where the bridge portion GBR is formed may perform a functionas a second sub-column spacer SCS2. When the bridge portion GBR overlapsthe shielding electrode SCOM, the shielding electrode SCOM may bedamaged by pressing of the display apparatus. According to the presentembodiment, the shielding electrode SCOM is not overlap the bridgeportion GBR, so that damage of the shielding electrode SCOM can bereduced although the display apparatus is pressed.

FIG. 14 is a plan view illustrating first to sixth pixel areas PX1 toPX6 of a display apparatus according to an example embodiment of theinventive concept. FIGS. 15A, 15B and 15C are plan views illustrating afirst color filter R, a second color filter G, and a third color filterB of the display apparatus of FIG. 14, respectively. FIGS. 16A, 16B and16C are cross-sectional views taken along line I-I′, II-II′ and III-III′of the display apparatus of FIG. 14, respectively.

Referring to FIGS. 14, 15A, 15B, 15C, 16A, 16B, and 16C, the displayapparatus may be substantially same as the display apparatus of FIG. 2,except for a shape of a first color filter R. Therefore, repeateddescription is omitted.

The first color filter R may provide color to light transmitted througha liquid crystal layer LC. The first color filter R may be a red colorfilter. The first color filter R may be disposed in the first pixel areaPX1, the second pixel area PX2, and the light blocking area BM. Morespecifically, referring again to FIG. 15A, the first color filter R maybe formed in a portion of the light blocking area BM adjacent to thefirst pixel area PX1 where a first thin film transistor TFT1 isdisposed, the first pixel area PX1, a portion of the light blocking areaBM between the first pixel area PX1 and the second pixel area PX2, andthe second pixel area PX2, along the first direction D1. The first colorfilter R may be formed in the portion of the light blocking area BMwhere the first thin film transistor TFT1 is disposed, a portion of thelight blocking area BM where a third thin film transistor TFT3 isdisposed, and a portion of the light blocking area BM where a fifth thinfilm transistor TFT5 is disposed, along a second direction D2.

Here, the first color filter R is not formed at a portion where a bridgeportion GBR is formed. Accordingly, the first color filter R formedalong the light blocking area BM. Accordingly, the bridge portion GBRmay be partially overlapped or not overlapped with the first colorfilter R, instead of being overlapped with entire of the first colorfilter R.

The first color filter R may be formed in a strip shape along the firstdirection D1 across a plurality of pixel areas. The first color filter Rmay be formed in a light blocking area BM corresponding to a pluralityof pixel areas in the second direction D2, and may be broken at aportion where the bridge portion GBR is formed.

In addition, an opening ROP where the first color filter R is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

Accordingly, a height of the second sub-column spacer SCS2 may be lowerthan the second sub-column spacer of the display apparatus of FIG. 2. Ifnecessary, a cut length of the first color filter R may be adjusted toadjust an overlapping area of the first color filter R and the bridgeportion GBR, so that overall height of the second sub-column spacer SCS2can be adjusted.

According to the present example embodiment, the first color filter R,the second color filter G and the third color filter B, which determinethe height of the second sub-column spacer SCS2, are formed by afull-tone exposure process without a half-tone exposure process, so thatthe height deviation problem of a sub-column spacer formed by thehalf-tone exposure process can be solved.

FIG. 17 is a plan view illustrating first to sixth pixel areas PX1 toPX6 of a display apparatus according to an example embodiment of theinventive concept. FIGS. 18A, 18B and 18C are plan views illustrating afirst color filter R, a second color filter G, and a third color filterB of the display apparatus of FIG. 17, respectively. FIGS. 19A, 19B and19C are cross-sectional views taken along line I-I′, II-II′ and III-III′of the display apparatus of FIG. 17, respectively.

Referring to FIGS. 17, 18A, 18B, 18C, 19A, 19B, and 19C, the displayapparatus may be substantially same as the display apparatus of FIG. 2,except for a shape of a third color filter B. Therefore, repeateddescription is omitted.

The third color filter B may be disposed in a fifth pixel area PX5, asixth pixel area PX6 and a light blocking area BM. More specifically,referring again to FIG. 18C, the third color filter B may be formed in aportion of the light blocking area BM adjacent to the fifth pixel areaPX5 where a fifth thin film transistor TFT5 is disposed, the fifth pixelarea PX5, a portion of the light blocking area BM between the fifthpixel area PX5 and the sixth pixel area PX6, and the sixth pixel areaPX6 along the first direction D1. In addition, the third color filter Bmay be formed in the portion of the light blocking area BM where a firstthin film transistor TFT1 is disposed, a portion of the light blockingarea BM where a third thin film transistor TFT3 is disposed, and aportion of the light blocking area BM where the fifth thin filmtransistor TFT5 is disposed, along the second direction D2.

Here, the third color filter B is not formed where a bridge portion GBRis formed, so that the third color filter B extending the light blockingarea BM is cut at the bridge portion GBR. Therefore, the bridge portionGBR may be partially overlapped or not overlapped with the third colorfilter B, instead of being overlapped with the entirety of the thirdcolor filter B.

Thus, the third color filter B be formed in a strip shape along aplurality of pixel areas in the first direction D1, may be formed in thelight blocking area BM corresponding to a plurality of pixel areas inthe second direction D2, and may have a cut portion at the bridgeportion GBR.

In addition, an opening BOP where the third color filter B is not formedmay be formed corresponding to a contact hole for the pixel electrodecorresponding to each of the pixel areas.

Accordingly, a height of a second sub-column spacer SCS2 may be lowerthan the second sub-column spacer of the display apparatus of FIG. 2. Ifnecessary, a cut length of the third color filter B may be adjusted toadjust an overlapping area of the third color filter B and the bridgeportion GBR, so that overall height of the second sub-column spacer SCS2can be adjusted.

FIGS. 20A, 20B, 20C, 20D, 20E, 20F, 20G and 20H are a method ofmanufacturing the display apparatus of FIG. 2.

Referring to FIG. 20A, a buffer layer 110 may be formed on a first basesubstrate 100. The buffer layer 110 may be formed by a spin coatingprocess, a chemical vapor deposition (CVD) process, a plasma enhancedchemical vapor deposition (PECVD) process, a high densityplasma-chemical vapor deposition (HDP-CVD) process, a printing process,etc.

A gate pattern may be formed on the buffer layer 110. The gate patternmay include a plurality of gate lines, first to third floatingelectrodes and gate electrodes. A conductive layer (not shown) may beformed on the buffer layer 110 and then the conductive layer may bepatterned by a photolithography process or an etching process using anadditional etching mask. Hence, the gate pattern may be provided on thebuffer layer 110. Here, the conductive layer may be formed by a printingprocess, a sputtering process, a CVD process, a pulsed laser deposition(PLD) process, a vacuum evaporation process, an atomic layer deposition(ALD) process, etc.

Referring to FIG. 20B, a first insulation layer 120 may be formed on thebuffer layer 110 on which the gate pattern is formed. The firstinsulation layer 120 may be formed by a spin coating process, a CVDprocess, a PECVD process, a HDP-CVD process, a printing process, etc.

An active pattern ACT and a data pattern may be formed on the firstinsulation layer 120. The data pattern may include a plurality of datalines, source electrodes, and drain electrodes. An active layer (notshown) may be formed on the first insulation layer 120, and then aconductive layer may be formed on the active layer. Then, the conductivelayer and the active layer may be simultaneously patterned to form theactive pattern and the data pattern.

Referring to FIG. 20C, a first color filter R may be formed on the firstinsulation layer 120 on which the data pattern is formed. Aphotosensitive resist may be coated on the first insulating layer 120,and then the first color filter R may be formed by patterning thephotosensitive resist through exposure and development using a mask. Inaddition, the first color filter R can also be formed by other methodssuch as an ink jet method.

Referring to FIG. 20D, a second color filter G may be formed on thefirst color filter R and the first insulation layer 120. Aphotosensitive resist may be coated on the first color filter R and thefirst insulating layer 120, and then the second color filter G may beformed by patterning the photosensitive resist through exposure anddevelopment using a mask. Here, the mask may be a full tone maskincluding a transmissive portion and a light blocking portion. Inaddition, the second color filter G can also be formed by other methodssuch as an ink jet method.

Referring to FIG. 20E, a third color filter B may be formed on the firstcolor filter R, the second color filter G and the first insulation layer120. A photosensitive resist may be coated on the first color filter R,the second color filter G and the first insulating layer 120, and thenthe third color filter B may be formed by patterning the photosensitiveresist through exposure and development using a mask. Here, the mask maybe a full tone mask including a transmissive portion and a lightblocking portion. In addition, the third color filter B can also beformed by other methods such as an ink jet method.

Referring to FIG. 20F, an organic insulation layer 130 may be formed onthe first to third color filters R, G, and B. The organic insulationlayer 130 may be obtained by a spin coating process, a printing process,a sputtering process, a CVD process, an ALD process, a PECVD process, anHDP-CVD process or a vacuum evaporation process in accordance withingredients included in the organic insulation layer 130. After formingthe organic insulation layer 130, the organic insulation layer 130 maybe patterned to form a contact hole (see CNT in FIG. 4) for a pixelelectrode PE through the organic insulation layer 130.

A transparent electrode pattern including the pixel electrode PE and ashielding electrode SCOM may be formed on the organic insulation layer130. A transparent conductive layer may be formed on the organicinsulation layer 130 to fill the contact hole. After that, thetransparent electrode pattern may be obtained by patterning thetransparent conductive layer. The transparent conductive layer may beformed by a sputtering process, a CVD process, a PLD cess, a vacuumevaporation process, an ALD process, a printing process, etc.

Referring to FIG. 20G, a main column spacer MCS and a first sub-columnspacer SCS1 may be formed on the organic insulation layer 130 on whichthe transparent electrode pattern is formed. A photoresist material maybe coated on the transparent electrode pattern and the organicinsulation layer 130, and then the main column spacer MCS and the firstsub-column spacer SCS1 may be obtained by exposure and developmentprocesses using a half-tone mask. The half-tone mask may include a lightblocking area, a full-tone area and a half-tone area. Light may fullypass in the full-tone area, and partially pass in the half-tone area.The main column spacer MSC may be formed corresponding to the full-tonearea, and the first sub-column spacer SCS1 may be formed correspondingto the half-tone area.

A first alignment layer AL1 may be formed on the organic insulationlayer 130 on which the main column spacer MCS and the first sub-columnspacer SCS1 are formed. The first alignment layer AL1 may be formed byapplying an alignment agent onto the organic insulation layer 130, andthen by an optical process such as rubbing or an optical process such aslight irradiation or a chemical process.

Referring to FIG. 20H, a common electrode CE may be formed on a secondbase substrate 200. The common electrode CE may be formed by forming atransparent conductive layer on the second base substrate 200. Thetransparent conductive layer may be formed by a sputtering process, aCVD process, a PLD process, vacuum evaporation process, an ALD process,a printing process, etc.

A second alignment layer AL2 may be formed on the common electrode CE.The second alignment layer AL2 may be formed by applying an alignmentagent onto the common electrode CE and then by an optical process suchas rubbing or an optical process such as light irradiation or a chemicalprocess.

A liquid crystal layer LC may be formed on the first alignment layer AL1and the second alignment layer AL2. A first polarizing plate POL1 and asecond polarizing plate POL2 may be attached to the first base substrate100 and the second base substrate 200, respectively. Accordingly, thedisplay apparatus may be manufactured.

A manufacturing method of the display apparatus of FIG. 6 may besubstantially the same as the manufacturing method of the displayapparatus of FIGS. 20A to 20H except that the second color filter isformed using a halftone mask. A manufacturing method of the displayapparatus of FIG. 9 may be substantially the same as the manufacturingmethod of the display apparatus of FIGS. 20A to 20H except for furtherforming a fourth color filter. On the other hand, a manufacturing methodof a display apparatus according to another embodiment can also bemanufactured by a similar method.

According to the present example embodiment, the light blocking functioncan be improved by overlapping of the first and third color filters, thefirst floating electrode, the gate pattern, the data pattern and theshielding electrode in the light blocking area of the display apparatus.Further, the shielding function can be improved by the gate line and theshielding electrode of the light blocking area. Accordingly, the displayapparatus can implement the light blocking area without an additionalblack matrix structure.

In addition, since the second sub-column spacer is formed by the bridgeportion of the display apparatus, the pressing gap of the displayapparatus can be effectively maintained.

The foregoing is illustrative of the inventive concept and is not to beconstrued as limiting thereof. Although a few example embodiments of theinventive concept have been described, those skilled in the art willreadily appreciate that many modifications are possible in the exampleembodiments without materially departing from the novel teachings andfeatures of the inventive concept. Accordingly, all such modificationsare intended to be included within the scope of the inventive concept asdefined in the claims. In the claims, any means-plus-function clausesare intended to cover the structures described herein as performing therecited function and not only structural equivalents but also equivalentstructures. Therefore, it is to be understood that the foregoing isillustrative of the inventive concept and is not to be construed aslimited to the specific example embodiments disclosed, and thatmodifications to the disclosed example embodiments, as well as otherexample embodiments, are intended to be included within the scope of theappended claims. The inventive concept is defined by the followingclaims, with equivalents of the claims to be included therein.

What is claimed is:
 1. A display apparatus comprising a plurality ofpixel areas and a light blocking area between the pixel areas,comprising: a first base substrate; a thin film transistor disposed onthe first base substrate corresponding to each of the pixel areas; afirst color filter having a first color and disposed on the first basesubstrate; a second color filter having a second color different fromthe first color, and disposed on the first base substrate; and a thirdcolor filter having a third color different from the first and secondcolors, and disposed on the first base substrate, wherein in the lightblocking area, the thin film transistor, the first color filter, and thethird color filter at least partially overlap each other, and the secondcolor filter in at least one pixel area is connected to an adjacentsecond color filter disposed in an adjacent pixel area by a bridgeportion, and the bridge portion is formed of the same material as thesecond color filter and is disposed in the light blocking area.
 2. Thedisplay apparatus of claim 1, wherein the first color is red, the secondcolor is green, and the third color is blue.
 3. The display apparatus ofclaim 2, wherein the first color filter extends in a first directionacross a plurality of pixel areas, the second color filter extends inthe first direction across a plurality of pixel areas, the third colorfilter extends in the first direction across a plurality of pixel areas,so that each of the first, second, and third color filters is arrangedin a strip shape.
 4. The display apparatus of claim 1, wherein thebridge portion does not overlap with the thin film transistor.
 5. Thedisplay apparatus of claim 1, further comprising: a fourth color filterdisposed on the first base substrate, the fourth color filter beingtransparent, wherein the first, second, and third color filters overlapwith the fourth color filter.
 6. The display apparatus of claim 1,further comprising: an organic insulation layer disposed on the first,second, and third color filters, and comprising an organic insulationmaterial.
 7. The display apparatus of claim 6, further comprising: ashielding electrode disposed on the organic insulation layer in thelight blocking area.
 8. The display apparatus of claim 7, furthercomprising: a pixel electrode electrically connected to the thin filmtransistor and formed from a same layer as the shielding electrode, andwherein the pixel electrode is electrically connected through a contacthole extending through the first color filter, the third color filter,and the organic insulation layer.
 9. The display apparatus of claim 8,further comprising: a floating electrode disposed on the first basesubstrate, and wherein the pixel electrode comprises a stem extending ina first direction or a third direction, and a plurality of slitsextending from the stem to an edge of the pixel electrode.
 10. Thedisplay apparatus of claim 1, further comprising: a second basesubstrate facing the first base substrate; a liquid crystal layerbetween the first base substrate and the second base substrate; and amain column spacer overlapping the first, second, and third colorfilters, and wherein the main column spacer is for maintaining a cellgap of the liquid crystal layer.
 11. The display apparatus of claim 10,wherein the bridge portion of the second color filter overlaps the firstcolor filter, the third color filter, or the first and third colorfilters, a second sub-column spacer which is smaller than the maincolumn spacer is formed by the bridge portion for maintaining a pressinggap of the liquid crystal layer.
 12. The display apparatus of claim 11,further comprising a first sub-column spacer which is smaller than themain column spacer for maintaining the pressing gap.
 13. The displayapparatus of claim 1, further comprising a shielding electrode disposedin the light blocking area and comprising a transparent conductivematerial, and wherein the shielding electrode is a mesh structure alongthe light blocking area, the second color filter is cut off at a portionwhere the bridge portion is disposed, so that the bridge portion doesnot overlap with the shielding electrode.
 14. The display apparatus ofclaim 1, wherein the first color is red, and the first color filter iscut off at a portion where the bridge portion is disposed, and thebridge portion entirely overlaps with the third color filter in thelight blocking area, and the bridge portion does not entirely overlapwith the first color filter.
 15. The display apparatus of claim 1,wherein the third color is blue, the third color filter is cut off at aportion where the bridge portion is disposed, and the bridge portionentirely overlaps with the first color filter in the light blockingarea, and the bridge portion does not entirely overlap with the thirdcolor filter.
 16. A display apparatus comprising a plurality of pixelareas and a light blocking area between the pixel areas, comprising: afirst base substrate; a thin film transistor disposed on the first basesubstrate corresponding to each of the pixel areas; a first color filterhaving a first color and disposed on the first base substrate; a secondcolor filter having a second color different from the first color, anddisposed on the first base substrate; and a third color filter having athird color different from the first and second colors, and disposed onthe first base substrate, wherein in the light blocking area, the thinfilm transistor, the first color filter, and the third color filter atleast partially overlap each other, and the second color filter isconnected to an adjacent second color filter by a bridge portion, andthe bridge portion and the second color filter comprise the samematerial.